plasma CapableOf enhance chemical vapor deposition
Typicality: 0.471
Saliency: 0.517

Facets 3
by sputtering 6 manner
among others 3 other
on methods 2 manner
Open triples 2
plasma → enhance → chemical vapor deposition 19
plasma → enhance → physical vapor deposition 4
Sentiment analysis
negative neutral positive
0.047 0.878 0.074
Other statistics
Raw frequency 23
Normalized frequency 0.517
Modifier score 0.500
Perplexity 200.173