| Typicality: | 0.460 |
| Saliency: | 0.492 |
| for manufacturing a semiconductor device | 6 | purpose |
| trench → be formed in → the substrate | 17 |
| trench → be formed in → substrate | 4 |
| trench → be formed in → substrate apparatus | 4 |
| negative | neutral | positive |
| 0.052 | 0.891 | 0.057 |
| Raw frequency | 25 |
| Normalized frequency | 0.492 |
| Modifier score | 0.500 |
| Perplexity | 411.247 |