thin film
→
ReceivesAction
→
formed
|
0.68
|
|
thin film
→
ReceivesAction
→
deposited
|
0.60
|
|
thin film
→
ReceivesAction
→
fabricated
|
0.54
|
|
thin film
→
ReceivesAction
→
formed on wafer
|
0.50
|
|
thin film
→
ReceivesAction
→
deposited by atomic layer depos…
|
0.45
|
|
thin film
→
ReceivesAction
→
obtained
|
0.45
|
|
thin film
→
ReceivesAction
→
irradiated by the laser pulse
|
0.43
|
|
thin film
→
ReceivesAction
→
loaded
|
0.40
|
|
thin film
→
ReceivesAction
→
applied
|
0.38
|
|
thin film
→
ReceivesAction
→
irradiated
|
0.38
|
|
thin film
→
ReceivesAction
→
loaded on first loading fixture
|
0.38
|
|
thin film
→
ReceivesAction
→
heated
|
0.30
|
|
thin film
→
ReceivesAction
→
shown in fig
|
0.30
|
|
thin film
→
ReceivesAction
→
deposited at room temperature
|
0.25
|
|
thin film
→
ReceivesAction
→
described in the literature
|
0.25
|
|
thin film
→
ReceivesAction
→
formed of small work function m…
|
0.25
|
|
thin film
→
ReceivesAction
→
formed with aluminum
|
0.25
|
|
thin film
→
ReceivesAction
→
removed
|
0.25
|
|
thin film
→
ReceivesAction
→
secured to the insulating circu…
|
0.25
|
|
thin film
→
ReceivesAction
→
deposited by evaporation
|
0.16
|
|