thin film
(subgroup of
film)
→
ReceivesAction
→
formed
|
0.68 | |
thin film
(subgroup of
film)
→
HasA
→
carbon
|
0.62 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
deposited
|
0.60 | |
thin film
(subgroup of
film)
→
HasA
→
thickness
|
0.57 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
fabricated
|
0.54 | |
thin film
(subgroup of
film)
→
CapableOf
→
form surface of the substrate
|
0.52 | |
thin film
(subgroup of
film)
→
CapableOf
→
comprise a metal coordination complex
|
0.50 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
formed on wafer
|
0.50 | |
thin film
(subgroup of
film)
→
HasProperty
→
amorphous
|
0.47 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
obtained
|
0.45 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
deposited by atomic layer deposition
|
0.45 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
irradiated by the laser pulse
|
0.43 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
loaded
|
0.40 | |
thin film
(subgroup of
film)
→
HasProperty
→
conformal
|
0.40 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
applied
|
0.38 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
loaded on first loading fixture
|
0.38 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
irradiated
|
0.38 | |
thin film
(subgroup of
film)
→
HasProperty
→
transparent
|
0.30 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
shown in fig
|
0.30 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
heated
|
0.30 | |
integrated circuit
(subgroup of
circuit)
→
MadeOf
→
thin film
|
0.29 | |
thin film
(subgroup of
film)
→
CapableOf
→
comprise an isotope layer
|
0.25 | |
thin film
(subgroup of
film)
→
CapableOf
→
apply to a heat package
|
0.25 | |
thin film
(subgroup of
film)
→
CapableOf
→
exhibit the lowest resistivity
|
0.25 | |
thin film
(subgroup of
film)
→
HasA
→
novel structure
|
0.25 | |
thin film
(subgroup of
film)
→
HasProperty
→
stable
|
0.25 | |
thin film
(subgroup of
film)
→
MadeOf
→
the like
|
0.25 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
removed
|
0.25 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
formed of small work function material
|
0.25 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
described in the literature
|
0.25 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
deposited at room temperature
|
0.25 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
secured to the insulating circuit substrate
|
0.25 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
formed with aluminum
|
0.25 | |
thin film
(subgroup of
film)
→
UsedFor
→
the cathode
|
0.25 | |
thin film
(subgroup of
film)
→
HasA
→
brownish gray color
|
0.16 | |
thin film
(subgroup of
film)
→
HasA
→
high resistivity
|
0.16 | |
thin film
(subgroup of
film)
→
HasA
→
excellent adhesion
|
0.16 | |
thin film
(subgroup of
film)
→
ReceivesAction
→
deposited by evaporation
|
0.16 |